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Metal CMP and brush cleaner

Metal CMP and brush cleaner THE OBJECT OF THE PROCUREMENT The procurement concerned the delivery of an automatic metal Chemical Mechanical Polishing (CMP) system with an integrated wafer cleaner for processing and planarization of 200 mm semiconductor wafers. The scope included the fully configured CMP tool, integrated cleaning unit, required accessories, and delivery, installation, and commissioning. Tool was acquired for processing of following applications: 1. Copper and barrier polishing steps for a. Integrated passive components b. CMOS wafers Back-End-of-the-Line (BEOL) and Mid-End…

Ostaja
TEKNOLOGIAN TUTKIMUSKESKUS VTT OY
Julkaistu
2026-11-11
Arvo
4 148 000 USD
Ilmoitus
61659

Voittajat ja hankinnan osat

Metal CMP and brush cleaner

THE OBJECT OF THE PROCUREMENT The procurement concerned the delivery of an automatic metal Chemical Mechanical Polishing (CMP) system with an integrated wafer cleaner for processing and planarization of 200 mm semiconductor wafers. The scope included the fully configured CMP tool, integrated cleaning unit, required accessories, and delivery, installation, and commissioning. Tool was acquired for processing of following applications: 1. Copper and barrier polishing steps for a. Integrated p…

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