High-vacuum chamber for thin-film synthesis
High-vacuum chamber for thin-film synthesis The Helsinki Accelerator Laboratory (HAL) at the Department of Physics of the University of Helsinki (UH) is going to acquire a multi-source high vacuum (HV) chamber for thin-film deposition using magnetron sputtering. The magnetron sources will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Key feature of the deposition chamber will be the ability to accommodate and deposited homogeneously on substrates with diameter up to…
- Ostaja
- University of Helsinki
- Julkaistu
- 2025-12-19
- Arvo
- 277 890 EUR
- Suorituspaikka
- Uusimaa
- Ilmoitus
- 36760
Voittajat ja hankinnan osat
High-vacuum chamber for thin-film synthesis
The Helsinki Accelerator Laboratory (HAL) at the Department of Physics of the University of Helsinki (UH) is going to acquire a multi-source high vacuum (HV) chamber for thin-film deposition using magnetron sputtering. The magnetron sources will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Key feature of the deposition chamber will be the ability to accommodate and d…
- PREVAC sp. z o.o. (PL6471782175) – 277 890 €